[P-2-4] Above-CMOS Metal-Pattern Technique for Flexible Inductance Adjustment in Rapid Prototyping of RF SoCs

K. Kotani¹、A. Sugimoto¹、Y. Omiya¹、T. Ito¹ (1.Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.P-2-4