[E-8-5] Controlling anion composition at MIS interfaces on III-V channels by plasma processing

W. Jevasuwan¹, Y. Urabe¹, T. Maeda¹, N. Miyata¹, T. Yasuda¹, A. Ohtake², H. Yamada³, M. Hata³, S. Lee⁴, T. Hoshii⁴, M. Takenaka⁴, S. Takagi⁴ (1.AIST, 2.NIMS, 3.Sumitomo Chemical Co., Ltd., 4.Univ. of Tokyo , Japan)

https://doi.org/10.7567/SSDM.2011.E-8-5