The Japan Society of Applied Physics

[PS-1-9] Interface Reaction Control of La2O3-gated InGaAs MOS Capacitors by Gate Metal Selection

D. H. Zadeh1、Y. Suzuki1、H. Omine1、K. Kakushima1、P. Ahmet1、Y. Kataoka1、A. Nishiyama1、N. Sugii1、K. Tsutsui1、K. Natori1、T. Hattori1、H. Iwai1 (1.Tokyo Tech. , Japan)

https://doi.org/10.7567/SSDM.2012.PS-1-9