16:15 〜 16:30
[D-2-03] Demonstration of High Channel Mobility and Low Trapped Electron Density of SiO2/SiC (0-33-8) Interfaces
○T. Masuda1, T. Hatakeyama1, S. Harada1, H. Yano2
(1.AIST (Japan), 2.Univ. of Tsukuba (Japan))
https://doi.org/10.7567/SSDM.2018.D-2-03