2016年 第77回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

4 JSAP-OSA Joint Symposia 2016 » 4.6 Nanocarbon and 2D Materials

[13p-A37-1~13] 4.6 Nanocarbon and 2D Materials

2016年9月13日(火) 13:15 〜 17:45 A37 (306-307)

松田 一成(京大)、宮内 雄平(京大)

17:15 〜 17:30

[13p-A37-12] Multifunctional Phosphonic Acid Self-Assembled Monolayer for Metal Patterning
and Ultrathin Gate Dielectrics in Fabrication of MoS2 Field-Effect Transistors

Wanjing Du1、Kawanago Takamasa1、Oda Shunri1 (1.Tokyo Tech.QNERC)

キーワード:Self-Assembled Monolayer, MoS2 Field-Effect Transistors

This study describes the applications of a self-assembled monolayer (SAM) to the fabrication of MoS2 FETs. SAM has the ability to generate highly aligned electrodes and provide excellent electrical insulation [1]−[3]. The fabrication process of MoS2 FETs includes removing metal layer on SAM and the utilization of SAM as an ultrathin gate dielectrics. This methods enables a rapid route to fabricate MoS2 FETs accompanied by low driving voltage.