[B-3-4] Materials and Electrical Characterization of Metal Gate Electrodes on High-k Dielectrics for Advanced CMOS Technologies
Jacob C. Hooker, Robert J. P. Lander, Z. M. Rittersma, Tom Schram, Guilherme S. Lujan, Jeroen van Zijl, Eric van den Heuvel, Fred Roozeboom
(1.Philips Research Leuven, 2.IMEC vzw, 3.Philips Research Labortories Nat. Lab.)
https://doi.org/10.7567/SSDM.2002.B-3-4
