[3H01-03] Pulse Radiolysis

[3H03] Dynamics of radical cation of polyhydroxystyrene-type resist polymers

*Kasumasa Okamoto¹, Yusa Muroya¹, Takahiro Kozawa¹ (1. Osaka Univ.)

Keywords:pulse radiolysis, electron beam, resist material, radiation chemistry, radical cation

In the EUV and electron beam lithography, which are micro/nanofabrication techniques using quantum beams, base polymers in resists are ionized to form radical cations. And the details of the dynamics are important for resist design. In this study, pulse radiolysis of polymer solutions with varying degrees of protection by t-BOC groups of poly(hydroxystyrene) was carried out to investigate the primary processes of their radical cations. In addition, a quantum chemical approach was combined to elucidate the dynamics of radical cation species.