[CFA8G] Mestasurface, Radiation Control, and Quantum Dots

[CFA8G-05] Colloidal Quantum Dot Nanopatterning with E-beam lithography on flexible PET

*Taewoo Ko¹, Samir Kumar¹, Sanghoon Shin¹, Byeongseok Kim¹, Sungkyu Seo¹ (1. Korea Univ. (Korea))

[Presentation Style] Onsite

Quantum Dot(QD) patterning of at least 100nm resolution is possible through electron beam lithography on various substrates of chromium, silicon, and flexible ITO substrates. The QD pattern fabricated with E-beam was durable in bending.