CLEO-PR2022/ISOM'22/ODF'22

講演情報

Oral Session

CLEO-PR2022 » QD Devices and Crystal Growth Technology

[CMP11A] QD Devices and Crystal Growth Technology

2022年8月1日(月) 13:30 〜 15:00 Room 104&105 (1F)

Session Chair: Tomohiro Amemiya (Tokyo Tech)

14:30 〜 14:45

[CMP11A-05] Post Growth Annealing and InGaSb Layer Insertion Effects of Metamorphic InAsSb on GaAs Substrate

*Koki Hombu1, Shota Nakagawa1, Yuto Iwakiri1, Koji Maeda1, Masakazu Arai1 (1. Univ. of Miyazaki (Japan))

[Presentation Style] Onsite

We investigated the effect of post-growth annealing on metamorphic InAsSb on GaAs. The mid-infrared range photoluminescence intensity was improved, however, the surface flatness was deteriorated. The photoluminescence was also improved by inserting the InGaSb layer.