CLEO-PR2022/ISOM'22/ODF'22

講演情報

Oral Session

CLEO-PR2022 » Fabrication Technologies for Plasmonics and Metamaterials

[CMP16B] Fabrication Technologies for Plasmonics and Metamaterials

2022年8月1日(月) 15:30 〜 16:45 Room 204 (2F)

Session Chair: Wakana Kubo (Tokyo Univ. of Agriculture and Tech.)

16:15 〜 16:30

[CMP16B-03] Fabrication technology of a low-loss plasmonic waveguide containing both “plasmonic- friendly” and “plasmonic- unfriendly” metals

*Vadym Zayets1, Iryna Serdeha2, Valerii Grygoruk2 (1. AIST (Japan), 2. Kyiv Univ. (Ukraine))

[Presentation Style] Online

Fabrication technology, which allows a substantial decrease of the plasmonic propagation loss for both a “plasmon- friendly” metal like Au, Cu or Al and “plasmon- unfriendly” metal like Co, Fe or Cr, have been developed and experimentally demonstrated. Optimization of the optical confinement is used to reduce the propagation loss below 1 dB per a plasmonic device.