[P-CM11] C11. Semiconductor and Integrated Optical Devices

[P-CM11-02] Advanced Dry Etching of GaAs/AlGaAs Multilayer Wafer for Circular Defect in Photonic Crystal (CirD) Laser

*Hanqiao Ye¹, Yifan Xiong¹, Rubing Zuo¹, Masaya Morita¹, Kenta Kaichi¹, Akihiro Maruta¹, Hirotake Kajii¹, Masato Morifuji¹, Masahiko Kondow¹ (1. Osaka Univ. (Japan))

[Presentation Style] Onsite

We improved dry etching process by introducing 3-steps etching and 3 layers of quantum dots for fabricating the CirD laser that will be used for intra-chip optical communications. Excellent lasing property was consequently obtained.