【１．電気化学基礎：1.1溶液化学、1.2反応・基礎一般、1.3測定法、1.4溶融塩】
セッション1（一般講演）

[1J03(一般講演)] 銅溶解析出反応におけるイオン空孔の静止半径と衝突半径

〇Yoshinobu Oshikiri¹, Satoshi Takagi², Takashi Asada², Makoto Miura³, Atsushi Sugiyama^4,11,10, Miki Miura⁵, Ryoichi Morimoto⁶, Iwao Mogi⁷, Yusuke Yamauchi^8,10, Ryoichi Aogaki^9,10 (1. Yamagata College of Industry & Technology, 2. Fukushima Univ. Graduate School of Symbiotic Systems Science, 3. Hokkaido Polytechnic College, 4. Research Organization for Nano and Life Innovation, Waseda Univ., 5. Polytechnic Center Kimitsu, 6. Saitama Industrial Technology Center, 7. Institute for Materials Research, Tohoku Univ., 8. Univ. of Queensland, 9. Polytechnic Univ., 10. National Institute for Materials Science, 11. Yoshino Denka Kogyo, Inc.)