Numerically Controlled Plasma Chemical Vaporization Machining Using an Array-Type Electrode with an Intermittent Gas Flow System

[B-3-2] Numerically Controlled Plasma Chemical Vaporization Machining Using an Array-Type Electrode with an Intermittent Gas Flow System

〇Ryohei Asada¹, Ken Nishida¹, Shinya Okayama¹, Satoshi Matsuyama¹, Kazuto Yamauchi¹, Yasuhisa Sano¹ (1.Osaka University, 2.Osaka University)

Keywords:Processing、Numerically controlled processing、Array-Type Electrode