Numerically Controlled Plasma Chemical Vaporization Machining Using an Array-Type Electrode with an Intermittent Gas Flow System

[B-3-2] Numerically Controlled Plasma Chemical Vaporization Machining Using an Array-Type Electrode with an Intermittent Gas Flow System

〇Ryohei Asada¹、Ken Nishida¹、Shinya Okayama¹、Satoshi Matsuyama¹、Kazuto Yamauchi¹、Yasuhisa Sano¹ (1.Osaka University、2.Osaka University)

キーワード：Processing、Numerically controlled processing、Array-Type Electrode