Observatory of Nano-scale Polishing Phenomena during SiO<sub>2</sub>-CMP process by Compact Apparatus applying Optical Evanescent Field

[D-1-17] Observatory of Nano-scale Polishing Phenomena during SiO₂-CMP process by Compact Apparatus applying Optical Evanescent Field

〇Thitipat Permpatdechakul¹, Panart Khajornrungruang¹, Keisuke Suzuki¹, Aran Blattler¹ (1.Kyushu Institute of Technology)

Keywords:Polishing、evanescent field、nanoscale phenomenon、nanoparticle、chemical mechanical polishing (CMP)