D-1 Nano-scale measurements and calibrations

[D-1-17] Observatory of Nano-scale Polishing Phenomena during SiO₂-CMP process by Compact Apparatus applying Optical Evanescent Field

〇Thitipat Permpatdechakul¹、Panart Khajornrungruang¹、Keisuke Suzuki¹、Aran Blattler¹ (1.Kyushu Institute of Technology)

キーワード：Polishing、evanescent field、nanoscale phenomenon、nanoparticle、chemical mechanical polishing (CMP)