F-1 Advanced surface processings

[F-1-1] Surface nanostructuring of silicon by intermediate-pressure hydrogen plasma treatment

〇Toshimitsu Nomura¹、Kenta Kimoto¹、Hiroaki Kakiuchi¹、Kiyoshi Yasutake¹、Hiromasa Ohmi¹ (1.Osaka university)

キーワード：Surface treatment、hydrogen plasma、optical management