[F-1-3] Plasma chemical vaporization machining of Ga2O3 using chlorine-based gas 〇Taiki Sai1, Yuma Nakanishi1, Satoshi Matsuyama1, Kazuto Yamauchi1, Yasuhisa Sano1 (1.Osaka University) Keywords:Surface treatment、Etching、Ga2O3、PCVM、