[F-1-3] Plasma chemical vaporization machining of Ga2O3 using chlorine-based gas 〇Taiki Sai1、Yuma Nakanishi1、Satoshi Matsuyama1、Kazuto Yamauchi1、Yasuhisa Sano1 (1.Osaka University) キーワード:Surface treatment、Etching、Ga2O3、PCVM、