Study on the growth of silicon films at low temperatures in atmospheric-pressure plasma excited by very high-frequency power

[F-1-5] Study on the growth of silicon films at low temperatures in atmospheric-pressure plasma excited by very high-frequency power

〇Shigeto Nawata¹, Masaya Maegawa¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Osaka university)

Keywords:Others、low-temperature deposition、atmospheric-pressure plasma、thin film transistors、polyethylene naphthalate