[Fr-2B] Wafer Manufacturing

[Fr-2B-01(Invited)] Fabrication of damage-free atomically smooth SiC surface using pure water and Ni catalyst

*Daisetsu Toh¹, Ryousuke Ohnishi¹, Pho Van Bui¹, Satoshi Matsuyama¹, Yasuhisa Sano¹, Kazuto Yamauchi¹ (1. Osaka Univ.(Japan))