ICSCRM2019

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Oral Presentation

MOS Gate Stacks and Device Processing

[Mo-2A] Oxidation and Nitridation

Mon. Sep 30, 2019 2:15 PM - 3:30 PM Room A (Kyoto International Conference Center)

2:30 PM - 2:45 PM

[Mo-2A-02] Investigation of SiC Microwave Plasma Oxidation Kinetics via Oxygen Isotope Labelling

*Nannan You1,2, Shengkai Wang1,2, Jilong Hao1,2, Yun Bai1,2, Xinyu Liu1,2 (1. Institute of Microelectronics of the Chinese Academy of Sciences(China), 2. University of Chinese Academy of Sciences(China))