Schedule 4 3:45 PM - 5:45 PM [Mo-P-21] Quantitative Characterization of Surface Polarity Dependence of Wetting Properties of V-doped SiC using a Novel Image Analysis Technique *Jung Gon Kim1, Woo Sik Yoo1, Dae Sung Kim2, Won Jae Lee2 (1. WaferMasters, Inc.(United States of America), 2. Dong-Eui Univ.(Korea))
