スケジュール 4 15:45 〜 17:45 [Mo-P-21] Quantitative Characterization of Surface Polarity Dependence of Wetting Properties of V-doped SiC using a Novel Image Analysis Technique *Jung Gon Kim1, Woo Sik Yoo1, Dae Sung Kim2, Won Jae Lee2 (1. WaferMasters, Inc.(United States of America), 2. Dong-Eui Univ.(Korea))