The 26th International Display Workshops (IDW '19)

Presentation information

Poster Presentation

[AMDp1] Oxide TFTs

Thu. Nov 28, 2019 10:40 AM - 1:10 PM Main Hall (1F)

10:40 AM - 1:10 PM

[AMDp1-4] Stable and High-mobility Oxide TFTs using Low-temperature Processed ZTO/IZO Stacked Channels

*Tsubasa Moritsuka1, Hiroyuki Uchiyama1 (1. Hitachi, Ltd. (Japan))

Keywords:Low-temperature, high-mobility, UV anneal, stacked channel, TFT

We fabricated Zn-Sn-O (ZTO)-based oxide and In-Zn-O (IZO) stacked channel thin-film transistors (TFTs) by experimentally using ultraviolet (UV) annealing for activation. The field-effect mobility was about 30 cm2/Vs, and the threshold voltage (Vth) was–3.5 V at the UV annealing temperature of 200°C. These TFTs improved the reliability of the negative gate bias illumination stress (NBIS) test more than the In-Ga-Zn-O (IGZO) TFTs did. The ZTO/IZO stacked channel TFTs are promising candidates for next-generation flexible devices.