Oral Session SP2

[SP2-03] Effects of N2/O2 flow rate ratios on the properties of titanium nitride oxide thin films grown using high power impulse magnetron sputtering with medium frequency

Cheng-Hao Tsai¹, Teng-Ping Chu^2,3, Min-Chen Chuang^2,3, Jyh-Wei Lee^1,2,4, *Sheng-Chi Chen^1,2,4, Phuoc Huu Le^2,3, Hui Sun⁵ (1. Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 243303, Taiwan, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 243303, Taiwan, 3. International Ph.D. Program in Plasma and Thin Film Technology, Ming Chi University of Technology, New Taipei City 243303, Taiwan, 4. College of Engineering and Center for Green Technology, Chang Gung University, Taoyuan 333, Taiwan, 5. School of Space Science and Physics, Shandong University, Weihai 264209, China)