A comparative study of Zr-O2, Zr-N2, Zr-CH4, and Zr-CF4 direct current reactive magnetron sputtering discharge characteristics

Presentation information

Oral Presentation

2.Sputtering and Plasma Process Technologies

Fri. Jul 5, 2024 2:50 PM - 4:40 PM Room O (Science Hall)

4:20 PM - 4:40 PM

*Eiji Kusano¹ (1. Kanazawa Institute of Technology)

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