[Mon-A2] Vacuum Vision 2030

[Mon-A2-3] Atomic Layer Deposition (ALD) in a Vacuum with Activated Species from Ozone for Oxide Film Synthesis

Naoto Kameda¹, Soichiro Motoda¹, Takayuki Hagiwara¹, *Ken Nakamura², Hidehiko Nonaka² (1. MEIDEN NANOPROCESS INNOVATIONS, Inc. (Japan), 2. AIST (Japan))

キーワード：vacuum, ozone, oxide, thin film, atomic layer deposition