IVC-22

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Parallel Sessions

Electronic Materials and Processing

[Mon-B2] Electronic Materials and Processing

Mon. Sep 12, 2022 3:30 PM - 5:30 PM Room B (Conference Hall)

4:30 PM - 4:45 PM

[Mon-B2-4] Polarity Control of Face-to-Face Annealed Sputtered AlN

*Kanako Shojiki1,2, Kenjiro Uesugi1, Shiyu Xiao1, Hideto Miyake1 (1. Mie Univ. (Japan), 2. Osaka Univ. (Japan))

Keywords:III-nitride semiconductor, AlN, Sputtering, Annealing, TEM

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