IVC-22

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Parallel Sessions

Vacuum Science and Technology

[Mon-D1] Vacuum Science and Technology -- Outgassing, Adsorption, Desorption

Mon. Sep 12, 2022 1:15 PM - 3:15 PM Room D (Mid-sized Hall B)

2:00 PM - 2:15 PM

[Mon-D1-4] Vacuum Performance of a Semiconductor Wafer Handling System made by Aluminum Alloy with Low Outgassing Surface Finish

*Naoki Ogawa1, Hiroki Kurisu2, Setsuo Yamamoto2 (1. RORZE Corporation (Japan), 2. Univ. of Yamaguchi (Japan))

Keywords:outgassing, aluminum alloy, surface finishing

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