[Wed-G1] Thin Film

[Wed-G1-2] Optimization of sputtering conditions for barrier layer to achieve lower resistivity of Ag multilayer

*Koji Mizukoshi^1,2, Takafumi Yamamura³, Yasuhiro Tomioka³, Midori Kawamura² (1. YKK AP Inc. (Japan), 2. Kitami Institute of Technology (Japan), 3. YKK Corporation (Japan))

キーワード：Ag, Sputtering, Electrical resistivity, Barrier layer, Low-E glass