[Wed-PO1A] Poster Session (12:30-14:00) Category A

[Wed-PO1A-14] Award Applied
Effect of Helium as Diluting Gas on Film Deposition Process during Acetylene Plasma

*Atsuya Kuwada¹, Tatsuo Nakai¹, Ryo Sasamoto¹, Masanori Shinohara², Takashi Matsumoto³, Satoshi Tanaka³ (1. Graduate school of engineering, Fukuoka University (Japan), 2. Department of Electrical Engineering, Fukuoka University (Japan), 3. Tokyo Electron Technology Solutions Limited (Japan))

Keywords:Acetylene Plasma, Helium, Deposition, FT-IR