日本金属学会 2020年春期(第166回)講演大会

Presentation information

Koubo Symposium

[S2] Materials Science and high temperature processing of widegap materials 2

Wed. Mar 18, 2020 12:45 PM - 6:00 PM Rm. I (W611,1st Flr., West Lecture Bldg.2)

座長:福山 博之(東北大学)、吉川 健(東京大学)、原田 俊太(名古屋大学)

1:25 PM - 1:45 PM

[S2.2] Growth of high-quality N-type 3-inch 4H-SiC crystals by solution method

*ZHU Can1, YU Wancheng1, IKUMI Motoki2, DANG Yifan2, ANDO Keisuke2, UNNO Takama2, HARADA Shunta1,2, TAGAWA Miho1,2, UJIHARA Toru1,2,3 (1. Imass, Nagoya Univ., 2. Graduate School of Engineering, Nagoya Univ., 3. GaN-OIL, AIST)

Keywords:溶液法、高品質、N型4H-SiC結晶、3イン

In this study, Sc is proved to effectively suppress hetero crystals. By adding Sc, we can obtain high quality and large size N-type SiC by solution method.

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