一般講演

[G] Electric/Electronic/Optical Materials

Wed. Sep 15, 2021 1:00 PM - 4:00 PM Rm. L (ZoomRm.L)

Chair:Hidekazu Tanaka(Osaka University)

※表示の講演時間には質疑応答時間も含みます。
（質疑応答時間5分、基調講演と招待講演は5～10分）

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1:00 PM - 1:15 PM

[262] Crystallization behavior of sputter grown amorphous MoTe₂ films

*Yuta SAITO¹, Shogo HATAYAMA¹, Kotaro MAKINO¹, Noriyuki UCHIDA¹, Yi SHUANG², Shunsuke MORI², Yuji SUTOU², Alexander KOLOBOV^1,3, Paul FONS^1,4 (1. AIST, 2. Tohoku Univ., 3. Herzen Univ., 4. Keio Univ.)

1:15 PM - 1:30 PM

[263] Change in electrical properties of amorphous Cr₂Ge₂Te₆ with various Cr contents

*Shogo HATAYAMA^1,2, Keisuke KOBAYASHI^3,4, Yuta SAITO¹, Paul FONS^1,5, Yi SHUANG², Shunsuke MORI², Alexander KOLOBOV^1,6, Yuji SUTOU² (1. AIST, 2. Tohoku Univ., 3. JASRI, 4. Kochi Univ. Tech., 5. Keio Univ., 6. Herzen State Pedagogical Univ.)

1:30 PM - 1:45 PM

[264] Electronic transport mechanism of MnTe polymorph film

*Mihyeon Kim¹, Shunsuke Mori¹, Yi Shuang¹, Shogo Hatayama¹, Daisuke Ando¹, Yuji Sutou¹ (1. Tohoku Univ.)

1:45 PM - 2:00 PM

[265] Absorption spectra of deteriorated PE

*Fumiki IWASAKI¹, Sampei Hirose¹, Noriyuki Sato², Yukio Kawano³, Tabao Tanabe¹ (1. Shibaura Institute of technology, 2. Industrial Technology Institute, 3. Chuo University)

break （2:00 PM - 2:15 PM）

2:15 PM - 2:30 PM

[266] Preparation of sulfur doped Vanadium oxide thin films by multi-step chemical vapor deposition process and their electrical transport property

*Akira HIRAO¹, Mahito YAMAMOTO², Yutaka WAKAYAMA³, Hidekazu TANAKA⁴ (1. Sanken, Osaka Univ., 2. Kansai Univ., 3. NIMS, 4. Sanken, Osaka Univ.)

2:30 PM - 2:45 PM

[267] Realization of the Fe₃O₄ thin film growth on transferable hBN flakes

*Shingo GENCHI¹, Ai I.　OSAKA¹, Azusa N.　HATTORI¹, Kenji WATANABE², Takashi TANIGUCHI², Hidekazu TANAKA¹ (1. Osaka Univ., 2. NIMS)

2:45 PM - 3:00 PM

[268] Preparation of Ti-doped α-Fe₂O₃ thin films by sputtering

*Seishi ABE¹ (1. Research Institute for Electromagnetic Materials)

3:00 PM - 3:15 PM

[269] EELS measurement of surface plasmon polariton dark mode in MIM structure

*Kentaro Itaya¹, Norihito Sakaguchi², Yuji Kunisada², Yasutaka Matsuo³ (1. Faculty of Engineering Hokkaido University, Japan,(Master’s degree), 2. Faculty of Engineering Hokkaido University, Japan, 3. RIES, Hokkaido University, Japan)

break （3:15 PM - 3:30 PM）

3:30 PM - 3:45 PM

[270] Characteristics of the Critical Current, n-value and Their Correlation of Superconducting Tapes with Multiple Small Cracks and One Accidental Crack

*Shojiro OCHIAI¹, Hiroshi OKUDA² (1. ESISM, Kyoto University, 2. Graduate School of Engineering, Kyoto University)

3:45 PM - 4:00 PM

[271] Preparation of graphene based AD films and their near-field noise suppression effect

*Masato Watanabe¹, Mitsuharu Sato², Masashi Matsuura², Satoshi Sugimoto² (1. Res. Inst. for Electromagnetic Mater., 2. Grad. school of Eng. Tohoku Univ.)

Sessions

9.Electric/Electronic/Optical Materials » Electric/Electronic/Optical Materials