Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17a-C1-1~8] 8.3 Plasma deposition of thin film and surface treatment

Tue. Sep 17, 2013 9:45 AM - 11:45 AM C1 (TC3 1F-101)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:45 AM - 10:00 AM

[17a-C1-1] Production of VHF-DC Superimposed Magnetron Plasma and Plasma Diagnostics

^○Hayato Ogawa¹, Yushi Fukuoka¹, Hirotaka Toyoda^1,2 (Nagoya Univ¹, PLANT, Nagoya Univ²)

10:00 AM - 10:15 AM

[17a-C1-2] Process Controllability of Plasma Enhanced Reactive Sputter Deposition for Formation of Semiconductor Thin Films

Yuichi Setsuhara¹, ^○Kosuke Takenaka¹, Hirofumi Otani¹, Atsuki Kanai¹, Soichiro Osaki¹, Akinori Ebe² (Osaka Univ.¹, EMD Corp.²)

10:15 AM - 10:30 AM

[17a-C1-3] Formation of ZnO Thin Films with Textured Structure by Plasma-Assisted Mist CVD

^○Kosuke Takenaka¹, Yuichi Setsuhara¹ (Osaka Univ.¹)

10:30 AM - 10:45 AM

△ [17a-C1-4] Low-temperature formation of silicon oxide film by mist chemical vapor deposition with atmospheric pressure plasma

^○(M2)Kuangda Sun¹, Keigo Takeda¹, Hitoshi Itoh^1,2, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹, Tokyo Electron Ltd.²)

10:45 AM - 11:00 AM

△ [17a-C1-5] Gas velocity dependence of cluster outflow amount from multi-hollow discharge plasmas

^○Susumu Toko¹, Yeon Won Kim¹, Yuji Hashimoto¹, Yoshinori Kanemitsu¹, Hyunwoong Seo¹, Giichiro Uchida¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (Kyushu Univ.¹)

11:00 AM - 11:15 AM

△ [17a-C1-6] Investigation of Resist Removal Characteristics using Microwave Excited Bubble Plasma under Water

^○(M2)Kouhei Nosaka¹, Tatsuo Ishijima¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹, Hideo Horibe², Yosuke Goto² (Kanazawa University¹, Kanazawa Institute of technology²)

11:15 AM - 11:30 AM

△ [17a-C1-7] Temperature Characteristic in Nitriding-Quenching for Low-Alloy Steel using Atmospheric-Pressure Plasma Jet

^○takashi inoue¹, ryuuta ichiki¹, hirohumi yamamoto¹, masashi yoshida², shuuichi akamine¹, seiji kanazawa¹ (Oita Univ¹, Shizuoka Inst. Sci. Technol.²)

11:30 AM - 11:45 AM

△ [17a-C1-8] Synthesis of Nitride Thin Film on Titanium with Atmospheric-Pressure Plasma Jet

^○Yuki Yoshimitsu¹, Ryuta Ichiki¹, Shogo Kannda¹, Masashi Yoshida², Shuichi Akamine¹ (Oita Univ.¹, Shizuoka Inst. Sci. Technol²)