[17a-C2-1~10] 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

9:15 AM - 9:30 AM

△ [17a-C2-1] Analysis of SiN/SiO₂ selectivity in fluorocarbon (FC)/hydrofluorocarbon (HFC) plasma etching

^○(M2)Keita Miyake¹, Michiro Isobe¹, Masanaga Fukasawa², Kazunori Nagahata², Tetsuya Tatsumi², Satoshi Hamaguchi¹ (Osaka Univ.¹, Sony corporation²)

9:30 AM - 9:45 AM

^○Kohei Mizotani¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (Osaka Univ.¹)

9:45 AM - 10:00 AM

^○Hu Li¹, Yu Muraki¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (Osaka Univ¹)

10:00 AM - 10:15 AM

^○(M2)Yu Muraki¹, Hu Li¹, Tomoko Ito¹, Kazuhiro Karahashi¹, Masaaki Matsukuma², Satoshi Hamaguchi¹ (Osaka Univ.¹, TEL Technology Center Tsukuba²)

10:15 AM - 10:30 AM

^○Takushi Shigetoshi¹, Masanaga Fukasawa¹, Kazunori Nagahata¹, Tetsuya Tatsumi¹ (Sony Corp.¹)

Break (10:30 AM - 10:45 AM)

10:45 AM - 11:00 AM

^○Kousa Hirota¹, Takeshi Omori¹, Nobuyuki Negishi¹ (Central Research Laboratory, Hitachi, Ltd.¹)

11:00 AM - 11:15 AM

^○Yan Zhang¹, Takuya Takeuchi¹, Hiroki Nagano¹, Kenji Ishikawa¹, Makoto Sekine¹, Keigo Takeda¹, Hiroki Kondo¹, Masaru Hori¹ (Nagoya Univ.¹)

11:15 AM - 11:30 AM

^○(D)Yusuke Kondo¹, Yudai Miyawaki¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Toshio Hayashi¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹)

11:30 AM - 11:45 AM

^○kazuaki kurihara¹, masahiko yoshiki¹, yasushi nakasaki¹ (Toshiba corp.¹)