Session information

Oral presentation

16. Amorphous and Microcrystalline Materials » 16.2 Processing technologies and devices

[18a-A4-1~9] 16.2 Processing technologies and devices

Wed. Sep 18, 2013 9:15 AM - 12:00 PM A4 (TC1 2F-216)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:15 AM - 9:45 AM

[18a-A4-1] [INVITED]Film properties of Silicon ink

^○Takashi Masuda^1,2, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ERATO², JST-ALCA³)

9:45 AM - 10:00 AM

[18a-A4-2] Effect of Anneal on Structural Property Distribution of Solution-Processed a-Si:H Films Along Thickness Direction

^○(M2)Yoo Sakuma¹, Keisuke Ohdaira^1,2, Takashi Masuda^1,3, Zhongrong Shen^1,2, Hideyuki Takagishi^1,2, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ALCA², JST-ERATO³)

10:00 AM - 10:15 AM

[18a-A4-3] Large Area Transfer of Silicon Films with Midair Cavity Using Meniscus Force

^○Shogo Nakamura¹, Kohei Sakaike¹, Muneki Akazawa¹, Takashi Fukunaga¹, Shohei Hayashi¹, Seiichiro Higashi¹ (Hiroshima Univ.¹)

10:15 AM - 10:30 AM

[18a-A4-4] Local Area Transfer of Tiny Si Films with Midair Cavity Using Meniscus Force

^○Takashi Fukunaga¹, Kohei Sakaike¹, Shogo Nakamura¹, Muneki Akazawa¹, Seiichiro Higashi¹ (Graduate School of Advanced Sciences of Matter, Hiroshima Univ.¹)

Break (10:30 AM - 10:45 AM)

10:45 AM - 11:00 AM

[18a-A4-5] Synthesis and characterization of Si clathrate thin films

^○(PC)Fumitaka Ohashi¹, Yoshi Iwai¹, Tomoya Sugiyama¹, Akihiro Noguchi¹, Kazuki Nagai¹, Masashi Hattori¹, Takuya Ogura¹, Roto Himeno¹, Takayuki Ban¹, Tetsuji Kume¹, Shigeo Sasaki¹, Shuichi Nonomura¹ (Gifu Univ.¹)

11:00 AM - 11:15 AM

[18a-A4-6] Reduction of Na concentrations in type II Si clathrate grown on Si substrate

^○Kazuhide Hayashi¹, Shogo Sunaba¹, Masataka Nomura¹, Kosuke Ota¹, Yoshiki Iwai¹, Fumitaka Ohashi¹, Takayuki Ban¹, Tetsuji Kume¹, Shuichi Nonomura¹ (Gifu Univ.¹)