Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[18a-C1-1~5] 8.3 Plasma deposition of thin film and surface treatment

Wed. Sep 18, 2013 9:00 AM - 10:15 AM C1 (TC3 1F-101)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

9:00 AM - 9:15 AM

[18a-C1-1] HfO₂ Deposition on Graphene with Plasma Enhanced Atomic Layer Deposition

^○Takeshi Kitajima¹, Toshiki Nakano¹ (Nat. Def. Acad.¹)

9:15 AM - 9:30 AM

^○Ryota Nomura¹, Ryusuke Nakamura¹, hitoshi Muguruma¹ (Shibaura Inst.¹)

9:30 AM - 9:45 AM

^○Da Xu¹, Lingyun Jia¹, Masayuki Nakamura¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

9:45 AM - 10:00 AM

^○Lingyun Jia¹, Jun Kuki¹, Leyong Yu¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ¹)

10:00 AM - 10:15 AM

^○Masayuki Nakamura¹, Lingyun Jia¹, Da Xu¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)