Symposium

Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

Wed. Sep 18, 2013 2:00 PM - 6:15 PM C5 (TC3 1F-115)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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2:00 PM - 2:30 PM

[18p-C5-1] Recent Trends of HiPIMS – The high-power pulse drive of a sputtering source -

^○Kingo Azuma¹ (Univ. Hyogo¹)

2:30 PM - 3:00 PM

[18p-C5-2] Film structure modification by ionized metal species in High Power Pulsed Magnetron Sputtering

^○Takeo Nakano¹, Shigeru Baba¹ (Seikei Univ.¹)

3:00 PM - 3:30 PM

[18p-C5-3] Comparison of the plasma ion processes at industrial scale

^○Satoshi Hirota¹, Rainer Cremer², Tetsuya Takahashi² (Kobe Steel¹, KCS²)

Break (3:30 PM - 3:45 PM)

3:45 PM - 4:15 PM

[18p-C5-4] High Density Production of Carbon Ions by High Power Impulse Magnetron Sputtering

^○Takashi Kimura¹ (Nagoya Inst. of Tech.¹)

4:15 PM - 4:45 PM

[18p-C5-5] Industrial Applications of Carbon Films using High Power Pulse Magnetron Sputtering Process

^○Masanori Hiratsuka^1,2, Nakamori Hideki¹ (Nanotec Corp.¹, Tokyo Univ. of Science²)

4:45 PM - 5:00 PM

△ [18p-C5-6] Development of Magnet-Free Sputtering System for Oxide Thin Film by Microwave Plasma

^○Tomonori Noda¹, Toshiya Hagihara¹, Hirotaka Toyoda^1,2 (Nagoya Univ.¹, PLANT, Nagoya Univ.²)

Break (5:00 PM - 5:15 PM)

5:15 PM - 5:45 PM

[18p-C5-7] The Small HIPIMS Plasma Source and the Application for Minimal Fab

^○Hisato Ogiso^1,2, Shizuka Nanano^1,2, Ken Yukimura¹, Akihiko Kato^2,3, Yuki Yabuta^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, Minimal², Seinan³)

5:45 PM - 6:15 PM

[18p-C5-8] HiPIMS-The future of materials processing created by high density metal plasma

^○Takashi Ikehata¹ (Ibaraki Univ.¹)