The 74th JSAP Autumn Meeting,2013

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Oral presentation

01. Applied Physics in General » 1.1 Applied physics in general

[16a-A2-1~3] 1.1 Applied physics in general

Mon. Sep 16, 2013 11:00 AM - 11:45 AM A2 (TC1 1F-116)

11:15 AM - 11:30 AM

△ [16a-A2-2] First-Principles Investigation on Chemical Mechanical Polishing Mechanism of α-Al2O3 Substrate by Silica Abrasive Grain

○Nobuki Ozawa1, Kang Zhou1, Takehiro Aizawa1, Yuji Higuchi1, Momoji Kubo1 (Tohoku Univ.1)

Keywords:化学機械研磨,第一原理計算,サファイア