[16p-A13-1~14] 7.3 Lithography

[16p-A13-9] Development of high power ArF excimer laser(120W) for semiconductor lithography tools（Ⅲ）

^○Motoki Honda¹, Youichi Sasaki¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc¹)

Keywords:リソグラフィ,エキシマレーザ,lithography