[16p-A2-1~8] 1.3 Novel technologies

[16p-A2-8] Dry Etching of Nb-TiO₂ Crystal Using SF₆-Plasma

^○Akihiro Matsutani¹, Kunio Nishioka¹, Dai Shoji¹, Mina Sato¹, Daito Kobayashi², Toshihiro Isobe², Akira Nakajima², Tetsu Tatsuma³, Sachiko Matsushita² (Semiconductor & MEMS, Tokyo Tech¹, Dep. Metal. & Ceramics, Tokyo Tech², IIS, Univ. Tokyo³)

Keywords:プラズマエッチング,フォトニック結晶