The 74th JSAP Autumn Meeting,2013

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Symposium » Challenge of next generation surface control on thehigh end semiconductor device in the industry

[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

Mon. Sep 16, 2013 1:00 PM - 5:15 PM C11 (TC3 2F-210)

4:30 PM - 4:45 PM

[16p-C11-10] Inline measurement of hydrogen peroxide concentration in CMP slurry using absorption spectroscopy

○So Takagi1, Takuya Onoda1, Yoshihiro Mori1 (HORIBA Ltd.1)

Keywords:CMP,濃度,吸収分光