[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

[16p-C11-4] Mechanism of wet etching in nanoscale region (2)

^○Atsushi Okuyama¹, Suguru Saito¹, Takashi Oinoue², Yoshiya Hagimoto², Hayato Iwamoto² (Sony Semiconductor¹, Sony²)

Keywords:ウェットエッチング