The 74th JSAP Autumn Meeting,2013

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Symposium » Challenge of next generation surface control on thehigh end semiconductor device in the industry

[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

Mon. Sep 16, 2013 1:00 PM - 5:15 PM C11 (TC3 2F-210)

2:45 PM - 3:00 PM

[16p-C11-6] Frictional Analysis of PVA brush for Post CMP Cleaning

○Toshiyuki Sanada1, Yoshitaka Hara1, Akira Fukunaga2, Hirokuni Hiyama2 (Shizuoka Univ.1, Ebara Coap.2)

Keywords:CMP