[17a-C1-1~8] 8.3 Plasma deposition of thin film and surface treatment

[17a-C1-2] Process Controllability of Plasma Enhanced Reactive Sputter Deposition for Formation of Semiconductor Thin Films

Yuichi Setsuhara¹, ^○Kosuke Takenaka¹, Hirofumi Otani¹, Atsuki Kanai¹, Soichiro Osaki¹, Akinori Ebe² (Osaka Univ.¹, EMD Corp.²)

Keywords:プラズマ支援反応性スパッタリング