[17a-C1-1~8] 8.3 Plasma deposition of thin film and surface treatment

△ [17a-C1-4] Low-temperature formation of silicon oxide film by mist chemical vapor deposition with atmospheric pressure plasma

^○(M2)Kuangda Sun¹, Keigo Takeda¹, Hitoshi Itoh^1,2, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹, Tokyo Electron Ltd.²)

Keywords:シリコン酸化膜,大気圧プラズマCVD,プリンタブルエレクトロニクス