A study on evaluation of damage induced by plasma processes using XPS

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

11:30 AM - 11:45 AM

^○kazuaki kurihara¹, masahiko yoshiki¹, yasushi nakasaki¹ (Toshiba corp.¹)

Keywords:エッチングダメージ　,XPS