The 74th JSAP Autumn Meeting,2013

Presentation information

Print

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[17a-C2-1~10] 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

9:45 AM - 10:00 AM

△ [17a-C2-3] Analyses of etching reactions of TaN and TaOx in view of Ta mask profile control

○Hu Li1, Yu Muraki1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (Osaka Univ1)

Keywords:磁性体エッチング,Tantalum,Mask