An Inhibition Mechanism for Surface Roughening of Photoresist During Plasma Etching Process with Plasma Cure

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

11:00 AM - 11:15 AM

^○Yan Zhang¹, Takuya Takeuchi¹, Hiroki Nagano¹, Kenji Ishikawa¹, Makoto Sekine¹, Keigo Takeda¹, Hiroki Kondo¹, Masaru Hori¹ (Nagoya Univ.¹)

Keywords:Plasma etching,Plasma Cure,Surface Roughening